About
TrentBorman
Materials ResearchNSF Graduate Fellow
About
I am currently a Ph.D. candidate and NSF Graduate Fellow in Materials Science and Engineering at Penn State University.
I am a materials scientist with seven years of thin film deposition experience, focusing primarily on physical vapor deposition (PVD). I have applied this expertise to develop processes across a broad range of materials systems using a range of techniques.
My current research focuses on the investigation of high energy deposition techniques for multi-component materials which are challenging to synthesize or densify. I recently developed my own technique for co-sputtering, which greatly reduces the time taken to calibrate accurate compositions.
I will be defending my doctorate on high energy sputter deposition in the late spring / early summer of 2020. As my graduate school career comes to an end, I am looking for a career which allows me to continue engineering processes and developing new techniques.
Skills
Research Skills and Analytical Techniques
Technical Skills
Thin film deposition and processing
- DC, RF, HiPIMS, reactive, and pulsed magnetron sputtering
- Electron beam evaporation
- Pulsed laser deposition
- Chemical solution deposition
- Wet and ion etching
- Focused ion beam
- Photolithography
Lab Management
- Design, assembly, install and maintenence of PVD equipment
- Helium leak checking
- Design and install of supporting infrastructure (gas, cooling water, electrical)
- Technical selection and procurement of equipment and materials
Characterization
- Electrical properties
- X-ray diffraction (XRD) & reflectivity (XRR)
- Atomic force microscopy
- Scanning electron microscopy
- Energy dispersive spectroscopy
Software
- Microsoft Office
- Python
- MATLAB
- OriginPro
- IgorPro
- X'Pert Reflectivity
- Solidworks
Soft Skills
- Design of experiments (DOE)
- Standard operating procedures (SOPs)
- Equipment training
Publications
First Author
First Author
3. Development of crystallographic texture in chemical solution deposited lead zirconate titanate seed layers.
A study of the factors which dictate the {001} texturing of PZT seed layers deposited on platinized silicon substrates. Strongly {001} textured seed layers with phase pure surface microstructures are critical for the growth of thick, {001} textured films. As such, a thorough study of the factors which influence seed layer quality was crucial.
Borman, T. M., Ko, S. W., Mardilovich, P. & Trolier-Mckinstry, S. Development of crystallographic texture in chemical solution deposited lead zirconate titanate seed layers. J. Am. Ceram. Soc. 100, 4476-4482 (2017).
2. Effect of lead content on the performance of niobium-doped {100} textured lead zirconate titanate films.
An investigation of the properties of PZT thick films grown under Zr/Ti gradient-free conditions with a wide range of lead stoichometries. A broad range of dielectric properties as well as the dielectric breakdown behavior of the deposited films were investigated.
Borman, T. M., Zhu, W., Wang, K., Ko, S. W., Mardilovich, P. & Trolier-McKinstry, S. Effect of lead content on the performance of niobium-doped {100} textured lead zirconate titanate films. J. Am. Ceram. Soc. 100, 3558-3567 (2017).
1. {001} Textured growth of doped, gradient free, lead zirconate titanate thin films by chemical solution deposition.
My master's thesis from Penn State University in fall of 2016. The roles of deposition conditions on the microstructure of platinized silicon substrates was investigated. Seed layers deposited using commercial PZT solutions over a wide range of concentrations, lead stoichometries and dopants were chracterized for texture and phase purity across multiple platinized substrates. Finally, gradient free thick films were deposited on textured seed layers for comparison to the gradient bearing films of the literature.
Borman, T. M. {001} Textured growth of doped, gradient free, lead zirconate titanate thin films by chemical solution deposition. (The Pennsylvania State University, 2016).
Included Authorship
Included Authorship
3. Influence of PbO content on the dielectric failure of Nb-doped {100}-oriented lead zirconate titanate films.
The mechanisms of dielectric breakdown in 1.5 micron thick Nb doped PZT thick films was studied. Both cracking and thermal breakdown were observed and the behavior was found to be a strong function of lead content used in the fabrication of the films. The assymetry of the breakdown with respect to field direction was also explored.
Zhu, W., Borman, T. M., DeCesaris, K., Truong, B., Lieu, M. M., Ko, S. W., Mardilovich, P. & Trolier-McKinstry, S. Influence of PbO content on the dielectric failure of Nb-doped {100}-oriented lead zirconate titanate films. J. Am. Ceram. Soc. (2018).
2. Improvement of reliability and dielectric breakdown strength of Nb-doped PZT films via microstructure control of seed.
A further investigation of the role of lead rich seed layers and platinized microstructures on the deposition of strongly textured PZT thick films. Furthermore, reliability and breakdown strengths were compared to the number of defective, secondary phase regions on the surface of the PZT seed layer.
Ko, S. W., Zhu, W., Fragkiadakis, C., Borman, T. M., Wang, K., Mardilovich, P. & Trolier-McKinstry, S. Improvement of reliability and dielectric breakdown strength of Nb-doped PZT films via microstructure control of seed. J. Am. Ceram. Soc. (2018).
1. Entropy-stabilized oxides
The notion of high entropy alloys was applied to the realm of oxides in this publication. Furthermore, rigirous demonstration that entropy is responsible for stabilizing the high entropy phase in the protoypical oxide (MgCoNiCuZn)O was established in this work. This protoypical oxide has been investigated by numerous other groups and a variety of novel properties have been reported for both the original and derivative compositions.
Rost, C. M., Sachet, E., Borman, T. M., Moballegh, A., Dickey, E. C., Hou, D., Jones, J. L., Curtarolo, S. & Maria, J.-P. Entropy-stabilized oxides. Nat. Commun. 6, 8485 (2015).
Goals
Future Goals
I am tentatively defending my Ph.D. in May/July 2020. With the knowledge I have gained through my prior research experiences here are some career path opportunities that would interest me.
Future Goals
Process Engineering
In my masters and Ph.D. research I was frequently tasked with developing schemes to synthesize challenging materials using thin film deposition techniques. This lead to my use of high energy deposition techniques and the development of new methods such as asynchronously patterned pulsed sputtering (APPS) for the deposition of dense refractory alloys at low temperatures. I would enjoy continuing to expand on my existing experience in processing research and development in new materials systems and application spaces.
Equipment Engineer / Applications Scientist
Both in my master's and doctoral careers I was frequently tasked with and developed a passion for developing or modifying equipment for a desired purpose. This further extends to teaching others how to use complex pieces of equipment and finding the limits and "tricks of the trade" to share with others who may be using the quipment. I would greatly enjoy a career that involves either developing complex scientific equipment, learning the capabilities of new equipment, or teaching end-users how to complete the tasks they wish to complete.